ACM Research (NASDAQ:ACMR) Ships First Ultra Lith KrF Track System to Chinese Logic Fab

2 min read | September 07, 2025 09:05 PM PDT | By Sonal Goyal

Highlights

  • ACM Research shipped its first Ultra Lith KrF track system to a leading Chinese logic wafer fab in September 2025.

  • The system achieves throughput of more than 300 wafers per hour with advanced thermal control and real-time monitoring.

  • The launch expands ACM’s lithography product line, building on the proven architecture of its ArF track platform.

ACM Research, Inc. (NASDAQ:ACMR), a supplier of wafer and panel processing solutions for the semiconductor and advanced packaging industries, announced the launch of its first Ultra Lith KrF track system. The system is designed to support front-end semiconductor manufacturing, expanding the company’s lithography product portfolio.

The first Ultra Lith KrF system was shipped in September 2025 to a leading Chinese logic wafer fab, marking a milestone in ACM’s lithography equipment roadmap.

Building on Proven ArF Track Platform

The new KrF system leverages the architecture and process capabilities of ACM’s ArF track platform. In late 2024, the ArF system completed demo-line process verification with a Chinese customer, demonstrating sub-angstrom-level coating uniformity, advanced thermal management, and ASML scanner-aligned CD matching.

These achievements served as the foundation for the KrF track system, enabling design optimization and further technological enhancements.

Technical Specifications and Capabilities

ACM’s Ultra Lith KrF track system features a flexible process module configuration with 12 spin coaters and 12 developers (12C12D). The system integrates 54 hot plates capable of low-, mid-, and high-temperature processing while maintaining high thermal uniformity.

The equipment achieves throughput greater than 300 wafers per hour (WPH), supporting high-volume manufacturing requirements. It incorporates ACM’s proprietary backside particle removal unit (BPRV), which reduces cross-contamination risk during processing.

Additionally, the integrated wafer-scale outlier inspection (WSOI) unit provides real-time monitoring for process variation and yield anomalies. This capability enhances process stability and supports efficient semiconductor production.

About ACM Research, Inc.

ACM Research develops, manufactures, and sells semiconductor process equipment for applications including wafer cleaning, electroplating, stress-free polishing, vertical furnace processes, track, PECVD, and wafer- and panel-level packaging. Its solutions are used across multiple steps in semiconductor manufacturing, aimed at improving productivity and yield.

The company provides customized, high-performance, and cost-effective tools that address the evolving needs of global semiconductor manufacturers.


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